SemiPOL high-precision grinding and polishing equipment can perform precise semi-automatic sample preparation for various materials, and can carry out high-precision grinding and polishing for various materials such as integrated circuits, semiconductor chips, optical components and optical fibers, petrographic phases, precision metal parts, etc. The processed materials can be directly used for microscopic analysis such as SEM, FIB, TEM, etc. Its target accuracy can reach the micron level, and it is mainly used in high-precision plane quantitative thinning operation scenarios. In addition, by matching with more accessories and fixtures, it can more easily and conveniently achieve grinding and polishing of complex and special-shaped surfaces. The equipment has the following features:
Grinding disc size: 8" (Φ203mm) or 10" (Φ254mm), flatness <2μm; Grinding disc speed: 0-350rpm, forward/reverse;
Blockage and drainage 10mm, resolution 1um, stable accuracy ±2um;
Can save 16 sets of commonly used grinding and polishing process parameters;
Large-diameter side-discharge water outlet, not easy to block and drain quickly;
Plug-in faucet design, convenient for cleaning and maintenance inside the disc.